Three additions to the GF100 Series offer higher flow, improved accuracy and a faster response time for gas flow control in semiconductor and LED manufacturing processes.
The GF101 high-purity mass flow controller is the high-flow version of the company's GF100 and features an all-metal seal flow path for durability and high leak integrity, as well as stable flow control and fast, sub-1 second settling times to help reduce non-productive tool time. It supports flow rates up to 300 slpm N2 equivalent. The GF121 ultra-high purity mass flow controller provides a compact controller option with flow rates up to 300 slpm N2 equivalent for process applications requiring ultra-high purity gas delivery. It provides the same compact footprint and all-metal seal flow path for durability and high leak integrity as the rest of the GF100 MFC Series. The GF126 ultra-high purity PTI mass flow controller builds on the earlier GF125 PTI model and is designed for process applications requiring high flow rates up to 300 slpm N2 equivalent and ultra-high purity in a compact device. It uses a proprietary control algorithm that maintains stable flow, combining the functionality of up to four independent devices (regulator, pressure transducer, temperature sensor, and MFC) into a single, compact, high-performance device. All three units feature multiple digital and analog I/O interface options.
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